Document Type

Article

Publication Date

2012

Abstract

Growth of Ga-doped ZnO by pulsed laser deposition at 200 °C in an ambient of Ar and H2produces a resistivity of 1.5 × 10−4 Ω-cm, stable to 500 °C. The resistivity can be further reduced to 1.2 × 10−4 Ω-cm by annealing on Zn foil, which reduces the compensating Zn-vacancy acceptor concentration NA to 5 × 1019 cm−3, only 3% of the Ga-donor concentration ND of 1.6 × 1021 cm−3, with ND and NA determined from a degenerate mobility theory. The plasmon-resonance wavelength is only 1060 nm, further bridging the gap between metals and semiconductors.

Comments

Copyright © 2012, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters 101.10, and may be found at http://dx.doi.org/10.1063/1.4748869.

DOI

10.1063/1.4748869


Included in

Physics Commons

Share

COinS