Schottky-Barrier Profiling Techniques in Semiconductors - Gate Current and Parasitic Resistance Effects

Authors

David C. Look, Wright State University - Main CampusFollow

Document Type

Article

Publication Date

1-15-1985

Abstract

The theory for obtaining mobility and carrier concentration profiles by the Hall-effect, magnetoresistance, and capacitance-conductance methods is developed in the relaxation-time approximation. This theory is then applied to semiconductors in which a Schottky barrier is used to control a depletion region. Particular emphasis is given to field-effect transistor structures which are ideally suited for geometric magnetoresistance measurements. A unique feature of the present model is the correction for finite gate (Schottky-barrier) current, which can be very important under forward-gate-bias conditions. The ability to use forward-bias makes the near-surface region more accessible. Also, parasitic resistance effects are treated. We apply these results to GaAs conducting layers formed by direct implantation of 4X10¹²/cm² , 100-keV Si ions into Cr-doped GaAs.

Comments

Copyright © 1985, American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in the Journal of Applied Physics 57.2, and may be found at http://jap.aip.org/resource/1/japiau/v57/i2/p377_s1

Repository Citation

Look, D. C. (1985). Schottky-Barrier Profiling Techniques in Semiconductors - Gate Current and Parasitic Resistance Effects. Journal of Applied Physics, 57 (2), 377-383.
https://corescholar.libraries.wright.edu/physics/106

DOI

10.1063/1.334762