Document Type
Article
Publication Date
1-1-2013
Identifier/URL
40936867 (Pure)
Abstract
The dependences of the 294 and 10 K mobility μ and volume carrier concentration n on thickness (d=25 to 147 nm) are examined in aluminum-doped zinc oxide (AZO). Two AZO layers are grown at each thickness, one with and one without a 20-nm-thick ZnON buffer layer. Plots of the 10 K sheet concentration ns versus d for buffered (B) and unbuffered (UB) samples give straight lines of similar slope, n=8.36×1020 and 8.32×1020 cm−3, but different x-axis intercepts, δd=−4 and +13 nm, respectively. Plots of ns versus d at 294 K produce substantially the same results. Plots of μ versus d can be well fitted with the equation μ(d)=μ(∞)/[1+d*/(d−δd)], where d* is the thickness for which μ(∞) is reduced by a factor 2. For the B and UB samples, d*=7 and 23 nm, respectively, showing the efficacy of the ZnON buffer. Finally, from n and μ(∞) we can use degenerate electron scattering theory to calculate bulk donor and acceptor concentrations of 1.23×1021 cm−3 and 1.95×1020 cm−3, respectively, and Drude theory to predict a plasmonic resonance at 1.34 μm. The latter is confirmed by reflectance measurements.
Repository Citation
Look, D. C.,
Droubay, T. C.,
& Chambers, S. A.
(2013). Model for Thickness Dependence of Mobility and Concentration in Highly Conductive Zinc Oxide. Optical Engineering, 52 (3), 130129.
https://corescholar.libraries.wright.edu/physics/1529
DOI
10.1117/1.OE.52.3.033801

Comments
This work is licensed under CC BY 4.0
