Electron-Paramagnetic-Resonance Study of GaAs Grown by Low-Temperature Molecular-Beam Epitaxy

Authors

H. J. Vonbardeleben
M. O. Manasreh
David C. Look, Wright State University - Main CampusFollow
K. R. Evans
C. E. Stutz

Document Type

Article

Publication Date

2-1-1992

Abstract

Electron-paramagnetic-resonance results demonstrate an arsenic-antisite related deep donor defect to be the dominant native defect in GaAs layers grown by low-temperature molecular-beam epitaxy (LTMBE). This defect is different from the EL2-related native arsenic-antisite defect. The thermal-equilibrium concentration of 3×1018 cm−3 ionized AsGa defects directly shows the additional presence of unidentified acceptor defects in the same concentration range. The defect distribution in GaAs grown by LTMBE is unstable under thermal annealing at T≳500 °C.

Comments

The original publication is available at http://prb.aps.org/abstract/PRB/v45/i7/p3372_1

Repository Citation

Vonbardeleben, H. J., Manasreh, M. O., Look, D. C., Evans, K. R., & Stutz, C. E. (1992). Electron-Paramagnetic-Resonance Study of GaAs Grown by Low-Temperature Molecular-Beam Epitaxy. Physical Review B, 45 (7), 3372-3375.
https://corescholar.libraries.wright.edu/physics/190

DOI

10.1103/PhysRevB.45.3372