YBa2Cu3O7-X-Ag Thick Films Deposited by Pulsed Laser Ablation
Document Type
Article
Publication Date
3-10-1998
Abstract
Ag-doped YBa2Cu3O7−x films, with thickness ranging from 0.06 to 2.5 μm, were deposited by pulsed laser ablation onto (100) LaAlO3 single-crystal substrates. The target was YBa2Cu3O7−x with 5 wt.% Ag addition. The presence of Ag in the films in concentrations of ∼1 at.% was detected by X-ray fluorescence and secondary ion mass spectrometry (SIMS) analysis. Biaxial alignment of the films was indicated by φ scans with full-width-half-maximum (FWHM) spread of 1–2° for various thicknesses. Utilizing a standard deposition process, most films showed a critical transition temperature (Tc) >90 K as measured by the ac susceptibility technique. Film critical current densities (Jc) on the order of 106 A/cm2 were measured at 77 K with a four-probe technique on a 100-μm-wide patterned microbridge.
Repository Citation
Varanasi, C.,
Biggers, R.,
Maartense, I.,
Peterson, T. L.,
Solomon, J.,
Moser, E. K.,
Dempsey, D.,
Busbee, J.,
Liptak, D.,
Kozlowski, G.,
Nekkanti, R.,
& Oberly, C. E.
(1998). YBa2Cu3O7-X-Ag Thick Films Deposited by Pulsed Laser Ablation. Physica C: Superconductivity and its Applications, 297 (3-4), 262-268.
https://corescholar.libraries.wright.edu/physics/1574
DOI
10.1016/S0921-4534(98)00011-2
